MFF Toolbench
Photolithography
The photolithography area includes facilities for resist application (Headway and CEE spinners), baking (Ovens and Hotplates), and wet benches for developing and stripping. Exposure tools include two contact aligners. For questions, contact the lithography area team.
Nanolithography
To learn more about our electron beam lithography system, visit its website at htttp://ebeam.mff.uw.edu/ or contact the area team.
Dry Etching
The dry etching area includes RIE and ICP etching, as well as a Barrel Asher. For questions about the dry etch area, contact the dry etch area team.
Physical Vapor Deposition
We have multiple systems for e-beam evaporation and sputter deposition. For questions about PVD, contact the PVD area team.
Chemical Vapor Deposition and Thermal Processing
For questions about CVD, including PECVD and LPCVD, contact the area team.
Metrology
For questions about SEM, contact the SEM team. For other metrology equipment, contact the metrology team.
For other questions, please contact the lab staff.
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